Chemical Solution Deposition of Functional Oxide Thin Films [electronic resource] /edited by Theodor Schneller, Rainer Waser, Marija Kosec, David Payne.
by Schneller, Theodor [editor.]; Waser, Rainer [editor.]; Kosec, Marija [editor.]; Payne, David [editor.]; SpringerLink (Online service).
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Item type | Current location | Call number | Status | Date due | Barcode |
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TA418.9.T45 (Browse shelf) | Available | ||||
Long Loan | MAIN LIBRARY | TA418.7-418.76 (Browse shelf) | Available |
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TA418.9.T45 Capillary Forces in Microassembly | TA418.9.T45 Evolution of Thin Film Morphology | TA418.9.T45 Thin Film Metal-Oxides | TA418.9.T45 Chemical Solution Deposition of Functional Oxide Thin Films | TA418.9.T45 Ion Beams in Materials Processing and Analysis | TA418.9.T45 Materials that Change Color | TA418.9.T45 Electrohydrodynamic Patterning of Functional Materials |
Introduction -- Solution Chemistry; Simple alskoxide based precursor systems; Carboxylate based precursor systems; Single-source precursors; Acqueos Precursor Systems; Solution Synthesis Strategies -- Analytical Methods; Introduction; Thermal Analysis; NMR Sepctroscopy; EXAFS; Other Methods (XRM, SEM,TEM;scattering methods at nanocrystalline films); Spin-Coating; Dip Coating; Inkjet Printing and Other Direct Writing Methods(dip point and imprint techniques); Chemical Bath Deposition; Polymer Assisted Deposition -- Processing and Crystallization; Thermodynamics and Heating Processes; Material Systems Dominated by Heterogeneous Nucleation; Material Systems Dominated by Homogeneous Nucleation; Low Temperature Processing; Epitaxial Films; Powder Assisted Film Fabrication; UV-and E-Beam Direct Patterning of Photosensitive CSD Films; Template Controlled Growth -- Functions and Applications; Introduction; Integrated Capacitors; Base Metal Electrodes; Polar Oxide Films for MEMS Applications;Conducting Films and Electrodes; Transparent conducting oxides; Superconducting Films; Porous Films for Gas Sensors; Luminescent Fims -- Appendix; Synthesis for Standard material Systems.
This is the first text to cover all aspects of solution processed functional oxide thin-films. Chemical Solution Deposition (CSD) comprises all solution based thin- film deposition techniques, which involve chemical reactions of precursors during the formation of the oxide films, i. e. sol-gel type routes, metallo-organic decomposition routes, hybrid routes, etc. While the development of sol-gel type processes for optical coatings on glass by silicon dioxide and titanium dioxide dates from the mid-20th century, the first CSD derived electronic oxide thin films, such as lead zirconate titanate, were prepared in the 1980’s. Since then CSD has emerged as a highly flexible and cost-effective technique for the fabrication of a very wide variety of functional oxide thin films. Application areas include, for example, integrated dielectric capacitors, ferroelectric random access memories, pyroelectric infrared detectors, piezoelectric micro-electromechanical systems, antireflective coatings, optical filters, conducting-, transparent conducting-, and superconducting layers, luminescent coatings, gas sensors, thin film solid-oxide fuel cells, and photoelectrocatalytic solar cells. In the appendix detailed “cooking recipes” for selected material systems are offered
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